Jet and Flash Imprint Lithography
Our proprietary Jet and Flash Imprint Lithography (J-FIL) process gives us direct control over one of the most critical stages of waveguide production.
This control carries through every waveguide we make, delivering consistent optical quality with precision, repeatability, and greater cost efficiency.
The J-FIL Advantage
Fewer Steps, Greater Control
A single imprinting step replaces a traditionally multi-stage workflow, allowing more waveguides to move through production while reducing complexity and costly defects. Fewer process steps also provides more control over the optical features that ultimately influence waveguide performance.
Proprietary Optical Resin
Our custom-formulated, high-refractive index photoresist is engineered specifically for our J-FIL process, allowing our Lithoflex machines to create highly precise waveguide structures using droplets as small as a trillionth of a liter.
Single-Pass Pattern Transfer
A polymer template carrying the waveguide pattern is pressed into liquid photoresist and UV-cured. This direct replication process locks the nanoscale features into place before etching begins and helps preserve uniformity from wafer to wafer.
Material Etching
The replicated pattern is permanently transferred into an optical coating on the wafer, creating the nanoscale structures that guide light through the finished waveguide. The result is a durable optical structure that is ready for subsequent manufacturing steps.
Surface Planarization
A meticulously engineered coating, called a spincoat layer, creates a smooth optical surface over the wafer, reducing visual artifacts like rainbows while supporting the clarity and performance.
Integrated into Manufacturing
Built for Better Production
Our J-FIL process is part of a broader manufacturing approach built around precision and control. By carefully managing every stage of pattern transfer and material application, we produce consistent waveguides from one wafer to the next.
Improved Yield Potential
Our precise J-FIL process creates complex 3D patterns in a single pass, reducing the chance of errors and defects.
Custom-Built Equipment
Our proprietary Lithoflex machines are purpose-built for J-FIL, enabling precise material placement and tightly controlled pattern transfer throughout production.
Lower Material Waste
Extremely small amounts of photoresist are dispensed onto wafers, requiring less material per batch than conventional methods and minimizing waste.
Higher Production Output
A simplified patterning process allows our manufacturing equipment to produce more waveguides in less time.
